Lucintel's latest market report analyzed that chemical mechanical planarization (CMP) slurry in the global electronic chemical provides attractive opportunities in the silicon wafer, optical substrate, and disk-drive component applications. The chemical mechanical planarization (CMP) slurry in the global electronic chemical market is expected to reach $2.2 billion by 2028 with a CAGR of 6.5%. In this market, aluminum oxide is the largest segment by product, whereas silicon wafer is largest by application.

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Based on product, the chemical mechanical planarization (CMP) slurry in the global electronic chemical market is segmented into aluminum oxide, cerium oxide, silica, and others. The aluminum oxide segment accounted for the largest share of the market in 2023 and is expected to register the highest CAGR during the forecast period, due to its increasing application in integrated circuits is because of its excellent electrical conductivity and efficiency.

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The Chemical Mechanical Planarization (CMP) Slurry in the Global Electronic Chemical Market is marked by the presence of several big and small players. Some of the prominent players offering chemical mechanical planarization (CMP) slurry in the global electronic chemical include Cabot, Hitachi, Samsung Electronics, Fujifilm Holdings, and The Dow Chemical.

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